The Editorial Board of Technology | Architecture + Design (TAD) would like to share its current Call for Papers on the theme of Matter.


Technology | Architecture + Design ( is a peer-reviewed international journal of the Association of Collegiate Schools of Architecture (ACSA) and is published by Taylor & Francis. The TAD Journal is printed semi-annually with a hardcopy distribution to 4200+ subscribers, with digital access available through Taylor & Francis Online, and indexed by Scopus.


TAD is a growing platform for disseminating research contributions and it invites original research for peer-review from educators, practitioners, researchers, scholars, architects, engineers, and scientists whose work engages the fields of technology, architecture, and/or design.


Both basic and applied research are necessary for advancing disciplinary expertise, and initiating interdisciplinary engagement on material solutions for use in the twenty-first century. A range of generative and analytical action will also be necessary including the methodological assessment of existing contexts, the generation of design-actionable research, and the authoring of inventive designs. TAD 4:2 – Matter seeks to attract and curate a combined body of knowledge for use in our continually-evolving material world.

Manuscripts featuring empirical, theoretical, and practice-based research utilizing an array of methodologies are welcome. Manuscripts for double-blind peer-review are due January 15, 2020. Standards for peer-review manuscripts can be found in the TAD Journal Author Guide.


Chad Kraus, Issue Editor, and on behalf of the TAD Editorial Board:


Caryn Brause, AIA, LEED BD+C, University of Massachusetts, Amherst
Chris Ford, AIA, Stanford University
Chad Kraus, RA, University of Kansas
Gregory Luhan, University of Kentucky
Scott Murray, RA, University of Illinois at Urbana-Champaign
Winifred Elysse Newman, Clemson University
Clare Olsen, RA, Cal Poly, San Luis Obispo
Jeana Ripple, AIA, LEED AP, University of Virginia
Anne-Catrin Schultz, Wentworth Institute of Technology
Marci Uihlein, PE, M.ASCE, Assoc. AIA, University of Illinois at Urbana-Champaign
Julian (Jialiang) Wang, PhD, Dr. Eng., LEED AP, Penn State University
Andrzej Zarzycki, RA, New Jersey Institute of Technology